InP Wafer | Power Wafertech Group

III-V Compound Wafers

InP Wafer

Indium Phosphide (InP) is a III‑V compound semiconductor with a direct bandgap (1.34eV at 300K) and higher electron mobility than GaAs. It offers superior performance in three key areas: high‑frequency RF (up to THz range), long‑wavelength optoelectronics (1.3–1.55µm), and low‑phase‑noise photonic integrated circuits.
  • Size Available in 2", 3", 4" and 6”
  • Orientation (100), (111)
  • Conduction type N-type (S-doped), P-type (Zn-doped)and Semi-insulating (Fe-doped)
  • Surface finished SSP or DSP, epi-ready
  • Packaging Single wafer cassette, vacuum sealed
  • Delivery door to door, short lead time
Detailed Specifications

Published specifications by wafer diameter.

Select a diameter to review the corresponding published specification set.

Parameter2”/50.8mm InP Substrate
Conduction TypeN-Type
DopantS
Orientation(100) / (111)
ConductivityN-type
Thickness350±25um
TTV<10um
Bow<10um
Warp<10um
EPD≤500cm⁻²
Surface FinishSSP / DSP, epi-ready
FlatSEMI standard
PackagingSingle wafer cassette, vacuum sealed
Applications

Where this wafer delivers value

01

Optical Communications & Photonics

InP wafers are widely used for long-wavelength optoelectronic devices operating around the 1.3 μm and 1.55 μm fiber-optic communication windows. Typical devices: DFB laser diodes EML lasers PIN photodiodes APDs Photonic integrated circuits AWG devices Recommended wafers: N-type / P-type / Semi-insulating InP, depending on device structure.

02

High-Speed & RF Electronics

InP offers high electron transport performance and is widely used for high-speed electronic and RF devices, including high-frequency MMICs and advanced semiconductor research. Typical devices: HBTs HEMTs High-frequency MMICs Frequency multipliers Terahertz detectors High-speed electronic devices Recommended wafers: Semi-insulating InP for RF/MMIC applications; conductive InP for selected HBT and electronic structures.

03

Photonic Integrated Circuits

InP is an important platform for integrated photonics because it supports both active optical devices and photonic integration. Typical applications: Optical transceivers Data-center interconnects Coherent communications Fiber-optic communications Photonic integrated circuits High-speed optical modules Recommended wafers: N-type, P-type or semi-insulating according to the epi and device architecture.

FAQ

Common questions about this product

Quick answers on material selection, customization, testing and ordering.

N-type and P-type InP wafers are conductive substrates commonly used for optoelectronic and electronic devices. Semi-insulating InP, typically Fe-doped, is particularly suitable for RF, microwave and high-frequency applications.

The suitable conductivity type depends on the device and epitaxial structure. N-type, P-type and semi-insulating InP can all be used for different optical communication device architectures.

Semi-insulating Fe-doped InP is commonly selected for RF, microwave and high-frequency devices because of its high resistivity and electrical isolation.

Yes. We support research, prototype and small-batch requirements, subject to the requested wafer specifications and quantity.

Technical Inquiry

Speak to Engineers About Your Wafer Needs

Share your material, dimensions, specifications, application or project stage. Our team will review your requirements and respond within one business day.

Engineering-led response

Inquiries are routed to the appropriate technical or commercial team.

Address

No. 1389, Lianmei Road, Lianhua Industrial Zone, Tong’an, Xiamen, Fujian 361100, China

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Emailvictorchan@powerwafertech.com Phone+86-592-5633652