III-V Epi Wafers | InP, GaAs, GaSb | Power Wafertech Group

III-V Semiconductor Epitaxial Wafers

III-V Semiconductor Epitaxial Wafer

Precision MOCVD/MBE-grown heterostructures on InP, GaSb, and GaAs substrates. Engineered for high-performance HEMTs, pHEMTs, HBTs, laser diodes, VCSELs, and IR detectors. Supporting custom epi structures from R&D to volume production.
  • Substrate — InP, GaSb, GaAs
  • Growth Method — MOCVD, MBE
  • Epi type — HEMT, pHEMT, HBT, LD, VCSEL, Photodetector, T2SL
  • Customization — Layer thickness, doping, and multi-layer stacks
  • Packaging — Single wafer cassette, vacuum sealed
Detailed Specifications

Specifications by wafer type.

Select a wafer type to view detailed specs

Material System Typical Structure Key Properties Primary Applications
InGaAs/InP PIN/APD Detector
HEMT Channel
High electron mobility
Absorption at 1.3–1.55µm
High-speed optical receivers
mmWave HEMTs
InGaAsP/InP Multiple Quantum Well Laser Structures Direct bandgap
Tunable wavelength
DFB Lasers, EMLs
Electro-absorption modulators (EAM)
Optical amplifiers
InAlAs/InGaAs/InP 2DEG Heterostructure Better gain
Lower noise
Higher power efficiency
Ultra-high-speed HEMTs and HBTs
LT-InGaAs
(Low Temperature InGaAs)
Low-Temperature Grown InGaAs Layer Ultra-high resistivity
Ultra-fast carrier lifetime
Terahertz photoconductive antennas
Ultra-fast photodetectors

Export Control Notice

Export of this product is regulated by the Ministry of Commerce of the PRC (MOFCOM). An export license must be obtained prior to shipment. Contact our compliance team for details.

Applications

Where this wafer delivers value

01

InP-Based Epitaxial Wafers

InP epitaxial wafers are engineered for high-speed optical communications and RF devices, supporting 1.3–1.55 µm optical communications, DFB/EML lasers, PIN/APD photodetectors, and mmWave HEMT/HBT applications.

02

GaSb-Based Epi Wafers

GaSb epi wafers are tailored for mid-wave and long-wave infrared (MWIR/LWIR) detection and imaging. Featuring Type-II superlattice (T2SL) structures, they enable high-performance T2SL detectors and gas sensing systems.

03

GaAs-Based Epitaxial Wafers

GaAs epitaxial wafers serve 5G/6G RF front-ends, near-infrared lasers, and high-brightness LEDs. Typical applications include 5G/6G pHEMT/HBT devices, VCSEL/near-IR laser diodes, red/yellow LEDs, and photoconductive switches.

FAQ

Common questions about this product

Quick answers on material selection, customization, testing and ordering.

Please provide the wafer diameter, crystal orientation, layer structure, layer thickness, doping requirements, quantity, and target device applications.

Yes. If you do not have a finalized layer structure, our technical team will discuss your target device, wavelength, frequency, or performance requirements and recommend a suitable epitaxial structure.

Yes. We support full customization of layer composition, thickness, doping, quantum-well structures, buffer layers, cap layers, and superlattice designs.

Technical Inquiry

Speak to Engineers About Your Wafer Needs

Share your material, dimensions, specifications, application or project stage. Our team will review your requirements and respond within one business day.

Engineering-led response

Inquiries are routed to the appropriate technical or commercial team.

Address

No. 1389, Lianmei Road, Lianhua Industrial Zone, Tong’an, Xiamen, Fujian 361100, China

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Emailvictorchan@powerwafertech.com Phone+86-592-5633652